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Tag: BEOL

Weebit Nano Brings ReRAM Benefits to the Automotive Market – Semiwiki

Non-volatile memory (NVM) is a critical building block for most electronic systems. The most popular NVM technology has traditionally been flash. As a discrete...

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Etch Processes Push Toward Higher Selectivity, Cost Control

Plasma etching is perhaps the most essential process in semiconductor manufacturing, and possibly the most complex of all fab operations next to photolithography. Nearly...

Gate Resistance in IC design flow

MOSFET gate resistance is a very important parameter, determining many characteristics of MOSFETs and CMOS circuits, such as: • Switching speed• RC delay• Fmax –...

DuPont Launches ULTRAFILL™ 6001 Dual Damascene Copper Plating Bath for…

For more than 10 years, leading-edge semiconductor manufacturers have relied upon DuPont’s dual damascene products for achieving semiconductor technology nodes below...

Process Innovations Enabling Next-Gen SoCs and Memories

Achieving improvements in performance in advanced SoCs and packages — those used in mobile applications, data centers, and AI — will require complex and...

How an Embedded Non-Volatile Memory Can Be a Differentiator

Embedded memory makes computing applications run faster. In the early days of the semiconductor industry, the desire to utilize large amount of on-chip memory...

How Does Line Edge Roughness (LER) Affect Semiconductor Performance At Advanced Nodes?

BEOL metal line RC delay has become a dominant factor that limits chip performance at advanced nodes . Smaller metal line pitches require a...

Detailed RF Characterization of Ultra-Thin Indium Oxide Transistors

A new technical paper titled “Record RF Performance of Ultra-thin Indium Oxide Transistors with Buried-gate Structure” was published by researchers at Purdue University and...

There Is Plenty Of Room At The Top: Imagining Miniaturized Electro-Mechanical Switches In Low-Power Computing Applications

The first computers were built using electro-mechanical components, unlike today’s modern electronic systems. Alan Turing’s cryptanalysis multiplier and Konrad Zuse’s Z2 were invented and...

Extending Copper Interconnects To 2nm

From low resistance vias to buried power rails, it takes multiple strategies to usher in 2nm chips.

The post Extending Copper Interconnects To 2nm appeared first on Semiconductor Engineering.

Fundamental Shifts In IC Manufacturing Processes

Emphasis shifts from speed to reliability and customization, slowing various process steps and when they are performed; sidelined equipment gains traction.

The post Fundamental Shifts In IC Manufacturing Processes appeared first on Semiconductor Engineering.

2D Semiconductors Make Progress, But Slowly

Controlling channels is a persistent problem with no simple solution.

The post 2D Semiconductors Make Progress, But Slowly appeared first on Semiconductor Engineering.

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