Electron beam lithography is commercially used to directly write submicron patterns onto advanced node masks. With the advent of EUV masks and nanometer-scale NIL...
The move to curvilinear shapes on photomasks is gaining steam after years of promise as a way of improving yield, lowering defectivity, and reducing...
Oct 16, 2023
(Nanowerk News) The light control performance of photonic crystals is closely related to their lattice constant, which typically requires the lattice...
Publisher’s note Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.This is a summary of: Liu, T. et...
Chip-to-chip and data center I/O drew investor interest in September, including support for several startups developing Compute Express Link (CXL) solutions. Elsewhere in the...
Huawei’s 7NM chip? This wasn’t supposed to happen
Are Chips a weapon for U.S. or China? Role reversal?
Will Taiwan turn from protected asset to unwanted...
