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Tag: lithography

China blocks the use of Intel chips in government computers

Beijing’s guidelines advise authorities and agencies to use homegrown software over foreign-made choices including Microsoft’s Windows operating system. Financial Times reported that China has implemented...

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Van der Waals quaternary oxides for tunable low-loss anisotropic polaritonics – Nature Nanotechnology

Halasyamani, P. S. & Poeppelmeier, K. R. Noncentrosymmetric oxides. Chem. Mater. 10, 2753–2769 (1998).Article  CAS  ...

Single-step fabrication of liquid gallium nanoparticles via capillary interaction for dynamic structural colours – Nature Nanotechnology

Tittl, A. Tunable structural colors on display. Light Sci. Appl. 11, 155 (2022).Article  CAS  PubMed  ...

Computational Lithography Solutions To Enable High NA EUV

This white paper identifies and discusses the computational needs required to support the development, optimization, and implementation of high NA extreme ultraviolet (EUV) lithography....

Yield Tracking In RDL

Yield is a much bigger issue when it comes to panel-level packages, which may contain up to 24 RDL layers. Just finding the defects...

A positive spin-electrospinning and electrospraying synergism for the nanomaterials industry

Feb 01, 2024 (Nanowerk News) Combining these two twins-tech, electrospinning and electrospraying, to fabricate novel nanomaterials is an urgent area of research for materials scientists...

OpenAI’s Sam Altman Aims to Revolutionize the AI Chip Manufacturing Industry

OpenAI’s CEO, Sam Altman, is embarking on a pathbreaking endeavor, raising billions to establish a network of AI chip factories, according to reports. Altman’s...

Metalens images dim nebula, galaxies shaped like pool noodles and surfboards – Physics World

To describe Federico Capasso at Harvard University as a prolific researcher is an understatement and I have been following his work in photonics for...

Non-EUV Exposures in EUV Lithography Systems Provide the Floor for Stochastic Defects in EUV Lithography – Semiwiki

EUV lithography is a complicated process with many factors affecting the production of the final image. The EUV light itself doesn’t directly generate the...

Nanoporous graphene-based thin-film microelectrodes for in vivo high-resolution neural recording and stimulation – Nature Nanotechnology

Material preparation and characterizationAqueous GO solution was diluted in deionized water to obtain a 0.15 mg ml−1 solution and vacuum filtered through a nitrocellulose membrane with...

Startup Funding: December 2023

Photonics and optics were strong in December, with investors funding two different companies using photonic technologies to develop AI chips and interconnects. Another key...

Novel memristor design clears critical impediments for future AI chips

Jan 04, 2024 (Nanowerk Spotlight) Researchers are pursuing memristors – resistive memory devices with properties similar to neurons – as a means to develop energy-efficient...

Application-Specific Lithography: Sense Amplifier and Sub-Wordline Driver Metal Patterning in DRAM – Semiwiki

On a DRAM chip, the patterning of features outside the cell array can be just as challenging as those within the array itself. While...

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