This recent technical paper titled “Realistic mask generation for matter-wave lithography via machine learning” was published by researchers at University of Bergen (Norway).
Abstract:“Fast production...
There is growing awareness that EUV lithography is actually an imaging technique that heavily depends on the distribution of secondary electrons in the resist...
New research paper titled “Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?,” from researchers at Fraunhofer-Institut für Integrierte Systeme...
To the general public, EUV lithography’s resolution can be traced back to its short wavelengths (13.2-13.8 nm), but the true printed resolution has always...
At this year’s SPIE Advanced Lithography conference, changes to EUV masks were particularly highlighted, as a better understanding of their behavior is becoming clear....
The semiconductor industry’s supply chain problems are prompting some innovative solutions and workarounds, and while they don’t solve all problems, they are improving efficiency...
What does it take to make your own integrated circuits at home? It’s a question that relatively few intrepid hackers have tried to answer, and the answer is usually something …read more
