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Tag: MEMS

CEO Interview: Stephen Rothrock of ATREG – Semiwiki

Stephen Rothrock founded ATREG in 2000 to help global advanced technology companies divest and acquire infrastructure-rich manufacturing assets. Over the last 25 years, his firm...

Building Better Bridges In Advanced Packaging

The increasing challenges and rising cost of logic scaling, along with demands for an increasing number of features, are pushing more companies into advanced...

Chip Industry Week In Review

By Liz Allan, Jesse Allen, and Karen Heyman Global semiconductor equipment billings dipped 2% year-over-year to US$25.8 billion in Q2, and slipped 4% compared with...

ams OSRAM providing sub-assembled RGB laser diodes to TriLite

News: Optoelectronics 7 September 2023 A technology collaboration has been announced in which ams OSRAM GmbH of Premstätten, Austria and Munich, Germany will provide...

Modeling EUV Stochastic Defects With Secondary Electron Blur – Semiwiki

Extreme ultraviolet (EUV) lithography is often represented as benefiting from the 13.5 nm wavelength (actually it is a range of wavelengths, mostly ~13.2-13.8 nm),...

Novel metamaterials leverage buckling to revolutionize vibration damping

Aug 02, 2023 (Nanowerk Spotlight) All mechanical systems exhibit vibrational resonances, where energy transmission through the structure spikes at certain natural frequencies. This resonance...

X-FAB leads EU-funded photonixFAB project to industrialize European silicon photonics value chain

News: Optoelectronics 15 June 2023 Analog/digital (mixed-signal) integrated circuit, micro-electro-mechanical system (MEMS) and specialty semiconductor foundry X-FAB Silicon Foundries SE of Tessenderlo, Belgium is...

A Primer on EUV Lithography – Semiwiki

Extreme ultraviolet (EUV) lithography systems are the most advanced lithography systems in use today. This article is a basic primer on this important yet...

Drop Mems: Mingle: Familiar moments from Mems Project

Do you remember the “Love is…” chewing gums, the inserts in which reflected such different, but close and familiar moments of lovers? Then this...

Reality Checks for High-NA EUV for 1.x nm Nodes

The “1.xnm” node on most roadmaps to indicate a 16-18 nm metal line pitch . The center-to-center spacing may be expected to be as...

Research Bits: April 4

Wet-like plasma etching Researchers from Nagoya University and Hitachi developed a new etch method called wet-like plasma etching that combines the selectivity of wet...

Trusted Sensor Technology For The Internet Of Things

“Data is the new oil” — Clive Humby, 2006 While this prediction relates to the value that can be generated from data, the focus...

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