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Tag: metrology

SpicyIP Weekly Review (November 8-November 15)

We’ve had a busy week at SpicyIP with lots of IP developments on and off the blog. Below, you’ll find our quick...

How indistinguishable are indistinguishable photons? New optical interferometer puts a number on it

In a sample of indistinguishable photons, just how indistinguishable are they? An international team of scientists has now answered this question...

FEOL Nanosheet Process Flow & Challenges Requiring Metrology Solutions (IBM Watson)

New technical paper titled “Review of nanosheet metrology opportunities for technology readiness,” from researchers at IBM Thomas J. Watson Research Ctr. (United States). Abstract (partial):“More...

High-throughput LHSI Reflectometry Technique For ICU and IWU Measurements of Semiconductor Devices

New technical paper titled “Toward realization of high-throughput hyperspectral imaging technique for semiconductor device metrology,” from researchers at Samsung Electronics Co. Abstract “Background: High-throughput three-dimensional metrology...

Innovation in optical interferometry: the secret of success in nanopositioning QA

Nanopositioning specialist Queensgate and the UK’s National Physical Laboratory (NPL) have forged a productive collaboration yielding a good-practice implementation model for Queensgate’s in-house test...

Highly Selective Etch Rolls Out For Next-Gen Chips

Manufacturing 3D structures will require atomic-level control of what's removed and what stays on a wafer.

The post Highly Selective Etch Rolls Out For Next-Gen Chips appeared first on Semiconductor Engineering.

Fundamental Shifts In IC Manufacturing Processes

Emphasis shifts from speed to reliability and customization, slowing various process steps and when they are performed; sidelined equipment gains traction.

The post Fundamental Shifts In IC Manufacturing Processes appeared first on Semiconductor Engineering.

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