The denunciations have died down of former U.S. President Donald Trump’s unprecedented recent invitation to Russia to attack NATO members that do not contribute...
This white paper identifies and discusses the computational needs required to support the development, optimization, and implementation of high NA extreme ultraviolet (EUV) lithography....
Nanoscale electron movement analysis using advanced light pulses
by Robert Schreiber
Oldenburg, Germany (SPX) Jan 10, 2024
Researchers from Sweden and Germany, including Dr. Jan Vogelsang from...
TOKYO, Dec 12, 2023 - (JCN Newswire) - Hitachi High-Tech Corporation ("Hitachi High-Tech") announced today the launch of its GT2000 high-precision electron beam metrology...
Nov 10, 2023
(Nanowerk News) Deep within every piece of magnetic material, electrons dance to the invisible tune of quantum mechanics. Their spins, akin...
Multiple attendees of ApeFest, a closed event exclusively accessible to holders of Bored Ape Yacht Club (BAYC) and Mutant Ape Yacht Club (MAYC), report...
Chip-to-chip and data center I/O drew investor interest in September, including support for several startups developing Compute Express Link (CXL) solutions. Elsewhere in the...
IntroductionTo catch a glimpse of the subatomic world’s unimaginably fleet-footed particles, you need to produce unimaginably brief flashes of light. Anne L’Huillier, Pierre Agostini...
Extreme ultraviolet (EUV) lithography is often represented as benefiting from the 13.5 nm wavelength (actually it is a range of wavelengths, mostly ~13.2-13.8 nm),...
The future of semiconductor technology is often viewed through the lenses of photolithography equipment, which continues to offer better resolution for future process nodes...
