TOKYO, Dec 12, 2023 – (JCN Newswire) – Kamfanin Hitachi High-Tech Corporation ("Hitachi High-Tech") ya sanar a yau ƙaddamar da tsarin sa na GT2000 mai madaidaicin ƙirar ƙirar lantarki. GT2000 tana amfani da fasahar Hitachi High-Tech da ƙwarewa a CD-SEM(1), inda ta ke da babban kaso na kasuwa. GT2000 sanye take da sababbin tsarin ganowa zuwa na'urorin 3D mai saurin yankewa. Har ila yau, yana amfani da ƙananan lahani mai girma mai saurin ma'aunin ma'auni mai yawa don High-NA EUV(2) tsayayya da hoton wafers don rage girman tsayayyar lalacewa da haɓaka yawan amfanin ƙasa a cikin samar da yawa.
Hitachi High-Tech GT2000 CD-SEM zai ba da damar madaidaicin ma'auni, ma'auni mai sauri, da dubawa a cikin tsarin masana'antu na na'urori masu tasowa na ci gaba, waɗanda ke ƙara ƙaranci da rikitarwa, kuma suna ba da gudummawa ga haɓaka haɓakar abokin ciniki a cikin bincike-da -ci gaba da yawan samarwa.
Fagen Ci Gaba
Kamar yadda tsarin samar da na'urori na semiconductor ke tasowa, bincike-da-ci gaban N2 (2-nanometer node) da A14 (14-angstrom node) yana gudana. Bugu da ƙari ga aikace-aikacen High-NA EUV lithography a cikin na'urori na zamani, ana sa ran ƙaddamar da tsarin na'ura zai karu, kamar tsarin GAA (3) da CFET (4).
Don haka, buƙatar samun saurin bayanai mai sauri a ƙarƙashin yanayin ma'auni mai yawa don auna kayan aiki da sifofi daban-daban, aikin barga da ƙarin haɓaka kayan aiki-zuwa kayan aiki a cikin matakan bincike da samar da taro don ci gaban aiwatar da na'urorin semiconductor. yana karuwa.
Mabuɗin Fasaha
1V matsananci-ƙananan hanzari ƙarfin lantarki da ultra-high-gudun Multi-point auna ayyuka ga High-NA EUV tafiyar matakai.
A cikin tsarin lithography na High-NA EUV, juriya da aka yi amfani da su sun fi bakin ciki kuma, sabili da haka, don auna shi da madaidaicin madaidaicin, kayan aikin metrology dole ne ya haifar da ƙarancin lalacewa kamar yadda zai yiwu ga juriya. GT2000 yana samun ƙarancin lalacewa da ma'aunin daidaitaccen ma'auni ta hanyar haɗa wutar lantarki mai ƙarancin ƙarfi na majagaba na 100V, tare da aikin sikanin saurin-sauri na mallakarmu. Bugu da ƙari, an sanye shi da yanayin ma'aunin ma'auni mai girman gaske don ƙayyadaddun ƙayyadaddun tsarin masana'antu da sauri da gano abubuwan da ba su da kyau a cikin bincike da matakin haɓakawa.
2. Tsarin ganowa mai girma don tsarin na'urar 3D
Na'urorin 3D masu sifofi irin su GAA, CFET, da ƙwaƙwalwar 3D suna buƙatar ma'auni na ƙirar' zurfin, rami' da gindin ramuka ban da ma'aunin CD na al'ada. GT2000 sanye take da wani sabon tsarin ganowa sosai wanda zai iya gano electrons da suka warwatse da kyau, yana ba da damar ingantattun hoto na tsarin na'urori masu rikitarwa da fadada yuwuwar sabbin aikace-aikacen aunawa.
3. Sabbin dandamali da sababbin tsarin na'urorin lantarki na lantarki don inganta kayan aiki-da-kayan aiki daidaitattun Ɗaya daga cikin mahimman abubuwan da ake bukata na CD-SEM, wanda ke da alhakin kulawa da tsari, shine bambancin ma'auni tsakanin kayan aiki da yawa yana da ƙananan. GT2000 sabon dandamali da na'urorin gani na lantarki an sake tsara su don kawar da duk wani abu da ke haifar da bambance-bambance a cikin ƙimar ma'auni, don haka, haɓaka kayan aiki-da-kayan aiki.
Ta hanyar ba da GT2000, kazalika da tsarin mu na metrology ta amfani da fasahar katako ta lantarki da tsarin binciken mu na gani, Hitachi High-Tech yana aiki don saduwa da buƙatun abokan ciniki daban-daban a cikin sarrafawa, aunawa, da dubawa a cikin tsarin masana'antar semiconductor. Za mu ci gaba da samar da ingantattun hanyoyin haɓakawa da haɓakawa na dijital ga samfuranmu don ƙalubalen fasaha masu zuwa, da ƙirƙirar sabbin ƙima tare da abokan cinikinmu, gami da ba da gudummawa ga masana'anta na yanki.
Yanar Gizo don GT2000
https://www.hitachi-hightech.com/global/en/products/semiconductor-manufacturing/cd- sem/metrology-solution/semi-gt2000.html
Bidiyo na Gabatarwa don GT2000
https://bcove.video/3TltYkl
(1) CD-SEM (Mahimmin Girman-Scanning Microscope): Kayan aikin da aka ƙera don yin ma'aunin ma'auni mai ma'ana mai kyau na ƙirar da'irar semiconductor da aka kafa akan wafers.
(2) Babban-NA (Lambobi) EUV (Extreme Ultraviolet): Matsanancin ultraviolet (13.5 nm raƙuman raƙuman ruwa) kayan aikin lithography tare da ingantaccen buɗewar lamba idan aka kwatanta da kayan aiki na al'ada.
(3) GAA (Gate All Around): Tsarin transistor wanda ƙofar ta rufe tashar gaba ɗaya
(4) CFET (Complementary Field Effect Transistor): Madaidaicin tasirin tasirin filin wanda a cikinsa aka tara na'urorin n-type da nau'in p-type.
Abubuwan da aka bayar na Hitachi High-Tech Corp
Kamfanin Hitachi High-Tech Corporation, wanda ke da hedkwata a Tokyo, Japan, yana tsunduma cikin ayyuka a fannoni daban-daban, gami da kera da siyar da masu nazarin asibiti, samfuran fasahar kere-kere, da na'urorin nazari, kayan aikin masana'antu na semiconductor da kayan bincike. da kuma samar da mafita mai ƙima a fannonin zamantakewa & masana'antu kayayyakin more rayuwa da motsi, da dai sauransu.
Haɓaka kudaden shiga na kamfanin na FY 2022 sun kai kimanin. JPY 674.2 biliyan. Don ƙarin bayani, ziyarcihttps://www.hitachi-hightech.com/global/en/
Contact:
Takumichi Sutani
Sashen Tsare-tsaren Kasuwanci, Tsarin Tsarin Mulki Div.,
Kamfanin Nano-Technology Solution Business Group, Hitachi High-Tech Corporation Tuntube mu: Hitachi High-Tech Corporation (hitachi-hightech.com)
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- Source: https://www.jcnnewswire.com/pressrelease/88032/3/
